Ionautics AB (Sweden) has launched the HiPSTER pulser for High-Power Impulse Magnetron Sputtering (HiPIMS).  The HiPSTER acts as pulse generator and drives a standard DC power supply.  Hence it may be simply added to existing sputtering systems.  

Ionautics HiPSTER

HiPIMS uses high power pulses to produce a more dense plasma in which a high proportion of the flux is ionised.  The high energy ions can produce smoother, denser films with enhanced charateristics, such as improved optical properties, higher electrical conductivity, etc. The HiPSTER and is able generate pulses over a full range of frequencies (up to 10kHz) and pulses are of constant voltage with minimum oscillation.   The HiPSTER has been fully tested in a variety of sputtering methods including reactive mode.    For further details please see the HiPSTER brochure or contact Portsdown Scientific.


New Argon Gas Cluster Ion Beam Source

Oxford Instruments has recently introduced the GCIB 10S, an argon cluster ion source. It is designed for use in XPS and SIMS surface analysis systems for depth profiling and cleaning of materials such as organics, polymers, graphene and sensitive coatings. Argon ion clusters are formed when high pressure gas expands into a vacuum. Clusters can range in size from Ar1 to > Ar3000 and are selectable by a mass filter. 

Argon gas cluster ion source

 Looking more like a Terminator weapon, the GCIB source is apparently gentle on samples


Traditional Ar1bombardment is known to cause significant damage to sensitive materials.   Now these types of samples may be analysed with minimal loss of chemical information.


Maximum beam energy (for singly charged ions) 10keV
Range of selectable cluster sizes Ar1 to > Ar3000
Ar1 maximum current > 500 nA
Ar1 minimum spot size < 250 µm
Ar1000 maximum current > 15 nA
Ar1000 minimum spot size < 250 µm
Ar2000 maximum current > 10 nA
Ar2000 minimum spot size < 250 µm
Maximum scan range (at 10keV) 8 mm x 8 mm


For more information or a quotation please contact Portsdown Scientific


The New mini Z UV for Water Vapour Desorption

RBD Instruments has announced a new addition to their line of water vapour desorption systems, the mini Z. This water vapour desorption system comprises a high power ultra-violet C emitter that fits inside a standard 1.5" ID vacuum chamber tube and a compact power supply which mounts directly to the 2.75" CF flange. 

mini Z UVmini Z UV










The mini Z is ideal for solving water vapour problems in compact vacuum chambers such as load locks, mini ALD chambers, pressure cells, etc. The 185nm UVC radiation power supply is simple to use – just turn it on when you start pumping! A remote ON/OFF option is available if you want to operate the mini Z by a process controller or set point.

Simple, effective and affordable – the mini Z is the perfect solution to water vapor problems in compact vacuum chambers. Produces 350 uW/cm2 @ 6cm from end of emitter (2.75" flange).  Also available for 4.5" CF flanges.

RBD Instruments also offers other products for UV water vapour desorption as well as the IR 100B an internal, flange-mounted infrared lamp for bake out. 


The HEX Modular Deposition System

The HEX Deposition system from Korvus Technology is an economical solution to PVD, suitable for teaching as well as research.  It comprises an aluminium frame with six interchangeable panels. The panels can accommodate up to three sources (sputter, thermal boat or e-beam) and a film thickness monitor.  

HEX Deposition system explained

Benchtop Deposition System


The 4" sample stage is built into the top panel and has handles for easy removal.  There are options for heating, rotation and a shutter. The system is pumped with a mini turbo. The HEX may be automated with Niobium deposition control software. 

HEX Sputter Source

The HEX Sputter Source


For further details please download the HEX brochure or contact Portsdown Scientific.