Introducing the FDG15 Ion Source from FOCUS GmbH

The FDG15 is designed to clean samples for surface analysis. It may also be used to perform simple depth profiling and even for charge neutralization in ESCA (with the low energy option).

FDG15 ion sourceAn extremely clean ion beam is ensured by a non-line-of-sight filament, a gas inlet directly into the ionization cage and effective differential pumping. The ionization is done by electron bombardment to allow for a continuous variable beam current from nA to μA.The spot size is variable, down to 300 μm and an integrated port aligner allows easy alignment on the sample.The power supply can be fully controlled by the front panel or via a TCP/IP interface. LabVIEW™ based PC software is provided.

For further details download the brochure or contact Portsdown.

Io, a Compact Solution for Ultra-Low Temperature from Oxford Instruments

Io is a compact, Cryofree® low vibration, continuous cooling solution offering device and sample temperatures to 50 mK.  Io is ideal for low temperature research and detector applications. It enables easy integration for a wide range of optical accessories such as windows, optical fibres, piezo-electric manipulators and neutron scattering tails. Together with a powerful 1 K circuit, Io is the perfect choice for quantum photonic measurements, detector development and beam-line applications. 

Io image

  • 50 mK base temperature with a temperature stability of ±20 µK
  • 30 µW cooling power at 100 mK and 300 µW at 250 mK
  • Separate 4He cooling circuit (1 K stage) for thermal anchoring of wiring
  • Optional integrated 8 T, 77 mm bore magnet
  • Temperature range of operation: 50 mK – 10 K with the magnet at full field
  • System cool-down time: < 24 h without magnet, < 36 h with magnet
  • Sample space: 150 mm diameter sample plate x 150 mm height
  • One 50 mm line-of-sight port for installation of up to 8 semi-rigid coaxes
  • Non-line-of-sight ports for installation of flexible wiring, including: DC looms, S1 coaxes, and optical fibres
  • Low-vibration platform: 1 W pulse-tube cooler, de-coupled from the experimental plates with flexible copper braids
  • Easy to assemble by a single user: locking mechanism on all vacuum cans and radiation shields

Visit the Io website or download the brochure 


Ionautics AB (Sweden) has launched the HiPSTER pulser for High-Power Impulse Magnetron Sputtering (HiPIMS).  The HiPSTER acts as pulse generator and drives a standard DC power supply.  Hence it may be simply added to existing sputtering systems.  

Ionautics HiPSTER

HiPIMS uses high power pulses to produce a more dense plasma in which a high proportion of the flux is ionised.  The high energy ions can produce smoother, denser films with enhanced charateristics, such as improved optical properties, higher electrical conductivity, etc. The HiPSTER and is able generate pulses over a full range of frequencies (up to 10kHz) and pulses are of constant voltage with minimum oscillation.   The HiPSTER has been fully tested in a variety of sputtering methods including reactive mode.    For further details please see the HiPSTER brochure or contact Portsdown Scientific.


New Argon Gas Cluster Ion Beam Source

Oxford Instruments has recently introduced the GCIB 10S, an argon cluster ion source. It is designed for use in XPS and SIMS surface analysis systems for depth profiling and cleaning of materials such as organics, polymers, graphene and sensitive coatings. Argon ion clusters are formed when high pressure gas expands into a vacuum. Clusters can range in size from Ar1 to > Ar3000 and are selectable by a mass filter. 

Argon gas cluster ion source

 Looking more like a Terminator weapon, the GCIB source is apparently gentle on samples


Traditional Ar1bombardment is known to cause significant damage to sensitive materials.   Now these types of samples may be analysed with minimal loss of chemical information.


Maximum beam energy (for singly charged ions) 10keV
Range of selectable cluster sizes Ar1 to > Ar3000
Ar1 maximum current > 500 nA
Ar1 minimum spot size < 250 µm
Ar1000 maximum current > 15 nA
Ar1000 minimum spot size < 250 µm
Ar2000 maximum current > 10 nA
Ar2000 minimum spot size < 250 µm
Maximum scan range (at 10keV) 8 mm x 8 mm


For more information or a quotation please contact Portsdown Scientific


The New mini Z UV for Water Vapour Desorption

RBD Instruments has announced a new addition to their line of water vapour desorption systems, the mini Z. This water vapour desorption system comprises a high power ultra-violet C emitter that fits inside a standard 1.5" ID vacuum chamber tube and a compact power supply which mounts directly to the 2.75" CF flange. 

mini Z UVmini Z UV










The mini Z is ideal for solving water vapour problems in compact vacuum chambers such as load locks, mini ALD chambers, pressure cells, etc. The 185nm UVC radiation power supply is simple to use – just turn it on when you start pumping! A remote ON/OFF option is available if you want to operate the mini Z by a process controller or set point.

Simple, effective and affordable – the mini Z is the perfect solution to water vapor problems in compact vacuum chambers. Produces 350 uW/cm2 @ 6cm from end of emitter (2.75" flange).  Also available for 4.5" CF flanges.

RBD Instruments also offers other products for UV water vapour desorption as well as the IR 100B an internal, flange-mounted infrared lamp for bake out. 


The HEX Modular Deposition System

The HEX Deposition system from Korvus Technology is an economical solution to PVD, suitable for teaching as well as research.  It comprises an aluminium frame with six interchangeable panels. The panels can accommodate up to three sources (sputter, thermal boat or e-beam) and a film thickness monitor.  

HEX Deposition system explained

Benchtop Deposition System


The 4" sample stage is built into the top panel and has handles for easy removal.  There are options for heating, rotation and a shutter. The system is pumped with a mini turbo. The HEX may be automated with Niobium deposition control software. 

HEX Sputter Source

The HEX Sputter Source


For further details please download the HEX brochure or contact Portsdown Scientific.


GLAD Stage by UHV Design

UHV Design has announced a new variant of their Epicentre series of deposition stages known as GLAD for GLancing Angle Depositon. Tilting of the substrate during deposition can produce interesting nanostructured features such as columns and helices. A great presentation on the possiblities can be found here. Applications include the use of the enhanced surface area in sensors, specialised optical devices, magnetic storage and more. 

UHV Design GLAD stage

Schematic of Glancing Angle Deposition


The GLAD stage has all the usual features and options of an Epicentre stage such as azimuthal rotation, heating to 1000oC, RF and DC bias, axial motion, etc. and, in addition provodes up to +/- 85 degrees sample tilt. The entire stage may also be rotated with an optional differentially pumped rotary feedthrough, allowing rotation of the angle of tilt.

This video shows the stage in action:



Full GLAD specifications

Check out more of the latest products from UHV Design here.


Fermi, a new UHV Variable Temperature Scanning Probe Microscope with a cold tip!

Fermi UHV Scanning Probe

Oxford Instruments has introduced the new Fermi variable temperature (VT) scanning probe microscope. In contrast to the usual situation the Fermi has both a cold sample and a cold scanning tip. This greatly reduces thermal drift (now <1 pm/sec) and means the sample is not shocked by a warm tip. The Fermi SPM is designed for maximum mechanical stability and incorporates optimised thermal shielding and heat flow control for stable temperature regulation.

The system includes the usual spring suspension/eddy current damping, and using a wobblestick the sample may be firmly clamped in position by a new locking mechanism. The flow cryostat, which may use either LN2 or LHe, does not require pumping, further reducing vibrations.eratures as low as 10K have been achieved at the sample stage, with the tip at ~25K.     

Other features include : 

-- Ports a for optical access to the sample and a port for in-situ evaporation

-- Tip exchange is possible without removing sample.

-- Bolt-on concept similar to previous SPMs from Omicron (see below)

-- Preamplifier technology as on the standard VT and LT SPMs

-- Qplus AFM option

-- Option for four electrical contacts

    Fermi bolt-on300

                                          The Fermi Bolt-on Concept

Additional information (requires registration) :

Fermi SPM brochure

Technical Article