The home of UHV science and nanotechnology in Singapore
Our new 32-175 Ion Gun Controller replaces the 32-165 effective immediately. The 32-175 has a front panel emission current meter that simplifies the operation of the IG2 ion source by allowing you to set the filament current with precision.The new 32-175 replaces the 32-165 controller and is compatible with the original 04-165 source as well…
The new Valved Thermal Cracker Cell VTCC is a full PBN valved cell with a water cooled cracker stage. The compact design of the cell allows its implementation on the space-saving DN40CF (O.D. 2.75″) flange. It features a crucible size of 130 cm3 which is sufficient for most R&D applications. This, in combination with the…
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The new Free Microplasma Source FMP provides a pure localized plasma for substrate cleaning applications, surface preparation or layer growth within an UHV chamber or MBE system at low chamber pressure. This setup provides high purity plasma creation with effectively reduced wall interaction as well as a drastically reduced RF power consumption due to the…